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Zeiss Auriga Focused Ion Beam FE SEM

Contact:
Rick Noll
noll@engr.wisc.edu
608-263-366



Zeiss Auriga Focused Ion Beam FE SEM

 

Combining the ultra high resolution GEMINI® field emission SEM column with the high performance Cobra FIB column into one integrated system, the Auriga® workstation is the perfect solution for three dimensional analysis with no compromises on SEM imaging capabilities. The live SEM imaging capability of the Auriga® during FIB operation mode gives full control when micro-machining critical samples. The stage is fully mechanically eucentric with compucentric rotate and tilt capability, allowing easy sample setup for SEM imaging or Focused Ion Beam work. The Auriga® series offers a comprehensive and versatile multi-channel gas injection system for ion beam deposition of metals or insulators and for enhanced etching. A wealth of options exist on the MSC system including a 5 gas injection system, as well as a single high angle gas injector for 0 degree, an in situ micromanipulator, and SE, Inlens SE, Inlens BSE, STEM and EDS detectors.

Key Features

  • Ultra high resolution FESEM with unique GEMINI® column
  • High performance Cobra FIB column
  • Auriga® operation: high resolution live imaging during milling and polishing
  • Endpoint detection for automated milling
  • Automated TEM preparation software package
  • Super eucentric, fully motorised stage
  • Highly reliable dry pumping system
  • Multi-channel gas injection system for charge compensation, material deposition and enhanced etching
  • Image archiving, networking and hardcopy solutions from the integral Windows® operating system
  • Inlens BSE detector
  • STEM detector

 

 

Specifications

 

Zeiss Auriga®

SEM

FIB

 

1.0 nm @ 15 kV
1.9 nm @ 1 kV

2.5 nm @ 30 kV guaranteed

 

12x - 1000kx

300x - 500kx

 

4 pA - 20 nA

1 pA - 50 nA

 

0.1 - 30 kV

<1 - 30 kV

 

Schottky Field Emitter

Ga liquid metal ion source (LMIS)

 

Annular In-lens SE Detector
Chamber: TV
Annular In-lens BSD
STEM

EDS

 

Gas Injection System

5 gases for selective etching, enhanced etching, material deposition, insulator deposition

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